Preceramic monomers for silicon carbonitride and nitride production by means of chemical vapor deposition
O. G. Ryzhova,
A. A. Grigoryev,
P. А. Storozhenko,
A. N. Polivanov,
S. V. Zhukova,
T. I. Shulyatyeva,
I. A. Timofeev,
Е. А. Bogachev
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Abstract
Tris(N-methyl)trimethylcyclotrisilazane (cyclosilazane-1) and tetra(N-methyl)tetramethylcyclotetrasilazane (cyclosilazane -2), that are promising preceramic monomers for the production of oxygen-proof materials based on silicon carbonitride and nitride by СVD and CVI, were obtained through methyldichlorosilane aminolysis, isolated and characterized by 1Н, 29Si NMR and gas-liquid chromatography. The conducted research resulted in the identification of factors effecting the reaction direction. According to solvent nature the reaction may be directed either towards cyclosilazane-1 formation or cyclosilazane-2 formation. In terms of efficiency, that is defined as cyclosilazane-1 to cyclosilazane-2 ratio, the solvents may be arranged in the following sequence: rubber solvent > rubber solvent + DE (diethyl ether) > nefras + DE > dichloromethane + DE > benzene.
Keywords
methyldichlorosilane,
aminolysis,
tris(N-methyl)trimethylcyclosilazane,
tetra(N-methyl)tetra-methylcyclotetrasilazane,
silicon nitride,
silicon carbonitride,
CVD/CVI
547.253+547.44+546.287
About the Authors
O. G. Ryzhova
ФГУП ГНИИХТЭОС
Russian Federation
Russian Federation
A. A. Grigoryev
ФГУП ГНИИХТЭОС
Russian Federation
Russian Federation
P. А. Storozhenko
ФГУП ГНИИХТЭОС
Russian Federation
Russian Federation
A. N. Polivanov
ФГУП ГНИИХТЭОС
Russian Federation
Russian Federation
S. V. Zhukova
ФГУП ГНИИХТЭОС
Russian Federation
Russian Federation
T. I. Shulyatyeva
ОАО «Композит»
Russian Federation
Russian Federation
I. A. Timofeev
ОАО «Композит»
Russian Federation
Russian Federation
Е. А. Bogachev
ОАО «Композит»
Russian Federation
Russian Federation
References
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Review
For citations:
Ryzhova O.G., Grigoryev A.A., Storozhenko P.А., Polivanov A.N., Zhukova S.V., Shulyatyeva T.I., Timofeev I.A., Bogachev Е.А. Preceramic monomers for silicon carbonitride and nitride production by means of chemical vapor deposition. Fine Chemical Technologies. 2012;7(2):51-57. (In Russ.)
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ISSN 2410-6593 (Print)
ISSN 2686-7575 (Online)
ISSN 2686-7575 (Online)
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